Time-of-flight secondary ion mass spectrometer

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The Plasma Profiling-TOFMS that has been developed by HORIBA Jobin Yvon within a EU research project is a unique instrumentation. It combines the speed of the plasma sputtering process with the rapidity and the sensitivity of time of flight mass spectrometry. The instrument is capable of bulk and depth profile analysis of thin and thick films with nanometre depth resolution. Compared to GD-OES, it offers higher sensitivity and provides isotopic and molecular depth profiling.

Specification:

• Mass Resolution: 3500 at m/z 208, High Resolution 5000 at m/z 208 Dynamic range: 107 Mass accuracy:
Mass Resolution: 3500 at m/z 208, High Resolution 5000 at m/z 208 Dynamic range: 107 Mass accuracy: 40 ppm Acquisition rate: 33 kHz to cover elements up to U (a full spectrum every 30 µs versus 150 ms with magnetic sector MS) Sensitivity: 103 cps/ppm Depth resolution: 3 nm Both negative and positive ion modes Flexible blanking capability up to 4 ions Easy and horizontal sample mounting